Carbon nitride Scanning electron microscopy Band gap A1 Characterization Oxides V2O3 Calcined clay A Chalcogenides Thin films Transmission electron microscopy Thin film B2 Semiconducting indium compounds AlN Titanium dioxide NEXAFS Nanotubes Biomasse Chalcogenide Films A Multilayers Buffer Couple Non-volatile memory Selenization Etching Colloidal solution CNTs’ collapse TiO2 Carbon nanotubes BOMBARDMENT Chalcogenides Amorphous Nanocomposite Sol-gel A Thin films CH4 X-ray photoelectron spectroscopy Residual stress Mott insulator Anatase TEM 3 nm in size Sputtering Bipolar resistive switching BRS Optical properties Atomic layer etching Capacitance Applications industrielles Ablation laser CHLORINE PLASMAS Structure Aluminium nitride Spectroscopic ellipsometry Alzheimer's disease Plasmas froids AZO thin films Semiconductors Physical vapor deposition Band alignment B2 Semiconducting alloys Mott insulators Amyloid precursor B Chemical synthesis Aryl-diazonium salts XPS Biofilms microbiens Adsorption SF 6 PECVD Atomic force microscopy B2 Quaternary X-ray diffraction CaTiO3Pr^3^+ Transfert d'énergie Avalanche breakdown A-CNx Ambipolar material Biocapteurs Copper C Photoelectron spectroscopy Chemical detection Chemical and biological sensors AuCu alloy Carbon Magnetron sputtering A3 Physical vapor deposition processes Alloying Vanadium Sesquioxide Functionalization Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Chalcogenide glass B1 Inorganic compounds Resistive switching Bixbyite Kirkendall effect CIGSe Low-pressure plasma processing B3 Solar cells Carbon Nanotube Plasma etching Cathepsin